The ability to produce three-dimensional (3D) microstructures is of increasing importance in the miniaturization of mechanical or fluidic devices, optical elements, self-assembling components, and tissue-engineering scaffolds, among others. Traditional photolithography, the most widely used process for microdevice fabrication, is ill-suited for 3D fabrication, because it is based on the illumin...

During the last decade laser processing of polymers has become an impoxtant field of applied and fundamental research. One of the most promising proposal, to use laser ablation as dry etching technique in photolithography, has not yet becume an industrial application. Many disadvantages of laser ablation, compared to conventional photolithography, are the result of the use of standard polymers....

A novel negative, inorganic polymer photoresist was demonstrated to be suitable for simple and direct fabrication of tribological SiCN-based ceramic microstructures via UV photolithography and subsequent pyrolysis at 800 degrees C.

This paper presents a general diagnostic system that can be applied to semiconductor equipment to assist the operator in finding the causes of decreased machine performance. Based on conventional probability theory, the diagnostic system incorporates both shallow and deep level information. From the observed evidence, and from the conditional probabilities of faults initially supplied by machin...

Previous hobbyists have demonstrated fabrication of single macroscale transistors and simple gates in silicon. These experiments, however, have been hampered by the inability to create features much below 1mm in size. This paper presents a simple and affordable projection photolithography technique which can be used to create microstructures using easily obtainable materials. Methods of alignme...

We propose an inexpensive novel rapid prototyping approach to a maskless and fully adaptive photolithographic process. Phase-only computer-generated holograms of lithographic masks displayed on a liquid-crystal-on-silicon spatial light modulator were used in a holographic optical lithography system. Using holographic projection allows diffraction-limited performance within the given parameters ...

This manuscript describes the fabrication of polymeric microneedle (MN) arrays by photolithography. It involves a simple mold-free process by using a photomask consisting of embedded micro-lenses. Embedded micro-lenses were found to influence MN geometry (sharpness). Robust MN arrays with tip diameters ranging between 41.5 µm ± 8.4 µm and 71.6 µm ± 13.7 µm, with two different lengths (1,336 µm ...