Photocatalytic wastewater treatment is expected to become a sustainable way of eliminating toxic chemicals. Due the surface-driven mechanism photocatalysis, surface area catalyst material plays crucial role in efficiency process, which usually achieved by nanoparticles. However, using powder materials introduces new problem: removing out clean water. As an alternative, atomic layer deposition (...

SiN deposition at low temperatures using the plasma-enhanced atomic layer (PEALD) process is gaining momentum. A high-quality deposited a lower thermal budget and wet etch rates are desired for front-end-of-line applications in semiconductor industries. In this study, of PEALD investigated by utilizing highly reactive trisilylamine silicon precursor three different reaction partners nitrogen pr...