Enhanced methanol sensing performance of oblique deposited WO3 thin films

HRTEM Microstructural Characterization of β-WO3 Thin Films Deposited by Reactive RF Magnetron Sputtering

Though tungsten trioxide (WO3) in bulk, nanosphere, and thin film samples has been extensively studied, few studies have been dedicated to the crystallographic structure of WO3 thin films. In this work, the evolution from amorphous WO3 thin films to crystalline WO3 thin films is discussed. WO3 thin films were fabricated on silicon substrates (Si/SiO2) by RF reactive magnetron sputtering. Once a...

Properties of Electrodeposited WO3 Thin Films

Galvanostatic electrodeposition was used to produce transparent and amorphous WO3 films that showed color changes from clear to blue in response to the applied potential of ±1.0 V. The 61% in transmittance variation was measured at wavelength of 633 nm. The roughness of 16.7 nm was obtained by atomic force microscopy (AFM). The scanning electron microscopy (SEM) evidenced homogeneous morphology...

Physical Properties of Reactively Sputter-Deposited C-N Thin Films

This work aims to prepare and study amorphous carbon nitride (CNx) films. Films were deposited by reactive magnetron radiofrequency (RF) sputtering from graphite target in argon and nitrogen mixture discharge at room temperature. The ratio of the gas flow rate was varied from 0.1 to 1. Deposited films were found to be amorphous. Highest Nitrogen concentration achieved was 42 atomic percent whic...

Theoretical and experimental characterization of TiO2 thin films deposited at oblique angles

The microstructural features of amorphous TiO2 thin films grown by the electron beam physical vapour deposition technique at oblique angles have been experimentally and theoretically studied. The microstructural features of the deposited films were characterized by considering both, the column tilt angle and the increase of the column thickness with height. A Monte Carlo model of the film growt...

Comparative study of sculptured metallic thin films deposited by oblique angle deposition at different temperatures

Metals with a wide range of melting points are deposited by electron beam evaporation under oblique deposition geometry on thermally oxidized Si substrates. During deposition the sample holder is cooled down to 77 K. It is observed that all obliquely deposited metals grow as tilted, high aspect ratio columns and hence with a similar morphology. A comparison of such columns with those deposited ...

A theoretical model for the electrical properties of chromium thin films sputter deposited at oblique incidence