Atomic Layer Deposition of Noble Metal Thin Films
نویسندگان
چکیده
3 Preface 4 List of publications 5 List of symbols and abbreviations 6
منابع مشابه
Band-Gap Tuning Of Electron Beam Evaporated Cds Thin Films
The effect of evaporation rate on structural, morphological and optical properties of electron beam evaporated CdS thin films have been investigated. CdS thin film deposited by electron beam evaporation method in 12nm/min and 60nm/min evaporation rates on glass substrates. X-ray diffraction, scanning electron microscopy, UV-Vis-NIR spectroscopy and Atomic Force Microscopy were used to character...
متن کاملAtomic/molecular layer deposition: a direct gas-phase route to crystalline metal-organic framework thin films.
Atomic/molecular layer deposition offers us an elegant way of fabricating crystalline copper(ii)terephthalate metal-organic framework (MOF) thin films on various substrate surfaces. The films are grown from two gaseous precursors with a digital atomic/molecular level control for the film thickness under relatively mild conditions in a simple and fast one-step process.
متن کاملAnodic Aluminum Oxide Templated Channel Electrodes via Atomic Layer Deposition
Dye-sensitized solar cells (DSSCs) utilize high surface area metal oxide sintered particle networks to absorb molecular dyes and transport injected charge carriers. While this sintered particle architecture allows liquid electrolyte DSSCs to achieve efficiencies up to 11%, slow charge transport through the semiconductor network limits the amount of modification that can be made to the electroly...
متن کاملAtomic Layer Deposition of Noble Metals – New Developments in Nanostructured Catalysts
This chapter will review recent progress in the use of atomic layer deposition (ALD) to prepare noble metal nanoparticle catalysts in which the nanoparticle size, composition, and local environment can be tailored on the atomic scale to tune the reactivity, selectivity, and thermal stability of the catalysts. ALD is a thin film growth technique that uses alternating cycles of self-limiting chem...
متن کاملFilm growth model of atomic layer deposition for multicomponent thin films
Atomic layer deposition sALDd has become an essential technique for fabricating nano-scale thin films in the microelectronics industry, and its applications have been extended to multicomponent thin films, as well as to single metal oxide and nitride films. A mathematical film growth model for ALD is proposed to predict the deposition characteristics of multicomponent thin films grown mainly in...
متن کامل