Metal Strips Deposited Using a Focused Ion Beam (fib): Technology and Characterization
نویسندگان
چکیده
Since the last years, Focused Ion Beam (FIB) has been growing in popularity as a microand nanofabrication tool, especially because it has shown exceptional capabilities and very high precision in both milling and depositing materials at the nanometer scale. Being a sputtering (physical) process, milling by FIB can be realized over a wide variety of materials. On the contrary, deposition involves a chemical reaction able to decompose a metalorganic chemistry and evaporate its volatile compounds leaving just the solid molecules. Then, this process takes place following an ion-assisted chemical vapor deposition (IACVD) procedure, which does not ensure high purity for the obtained material, as organics and even the ions of the focused beam can contaminate it.
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