Resistance Post-Trim Drift Index for Film Resistors to be Trimmed
نویسنده
چکیده
This paper discusses a method to evaluate post-trim drifts of laser trimmed film resistor. Based on mathematical flux field computations a drift index is deduced. This index as a part of mathematical laser trim simulations gives an imagination of expected post-trim drifts already on design stage and thereby a method to improve precision and reliability of hybrid IC’s by trim strategy design.
منابع مشابه
Advanced electrical and stability characterization of untrimmed and variously trimmed thick-film and LTCC resistors
As-fired thick-film resistors have the resistance tolerance within ±20% and this tolerance is increased for smaller components. Therefore the novel trimming methods are necessary for microresistors, especially when they are embedded in LTCC substrate. This paper compares electrical (normalized temperature dependence of resistance, low frequency noise) and stability properties (relative resistan...
متن کاملCharacterization, Evaluation, and Comparison of Laser-Trimmed Film Resistors
Methodsfor predictingthe performanceof laser-trimmed film resistors taking into account the properties of the heat-affected zone (HAZ) are discussed. A figure of merit based npon a sensitivity fnnction called HAZ sensitivity, SHA z , is introduced which is useful for determining aging and temperature effects of an arbitrary film-resistor geometry with an arbitrary trim strategy. ~H4 z is also s...
متن کاملEffect of Abrasive Machining on the Electrical Properties Cu86Mn12Ni2 Alloy Shunts
This paper studies the effect of abrasive trimming on the electrical properties of Cu86Mn12Ni₂ Manganin alloy shunt resistors. A precision abrasive trimming system for fine tuning the resistance tolerance of high current Manganin shunt resistors is proposed. The system is shown to be capable of reducing the resistance tolerance of 100 μΩ shunts from their standard value of ±5% to <±1% by removi...
متن کاملE M
Niobium thin film nanostructures were fabricated using electron beam lithography and a liftoff process involving a four layer resist system. Wires having micrometres in length and below 200nm in width were deposited on an insulating substrate and subsequently thinned by anodisation. The resistance of the wires was monitored in situ and could be trimmed by controlling the anodisation voltage and...
متن کاملEffect of Annealing Process on the Properties of Ni(55%)Cr(40%)Si(5%) Thin-Film Resistors
Resistors in integrated circuits (ICs) are implemented using diffused methods fabricated in the base and emitter regions of bipolar transistor or in source/drain regions of CMOS. Deposition of thin films on the wafer surface is another choice to fabricate the thin-film resistors in ICs' applications. In this study, Ni(55%)Cr(40%)Si(5%) (abbreviated as NiCrSi) in wt % was used as the target and ...
متن کامل