Introduction to Electron Beam Lithography
نویسنده
چکیده
Electron Beam Lithography is a specialized technique for creating extremely fine patterns (~ 50 nm). Derived from the early scanning electron microscopes, the technique in brief consists of scanning a beam of electrons across a surface covered with a resist film sensitive to those electrons, thus depositing energy in the desired pattern in the resist film. The main attributes of the technology are: 1) it is capable of very high resolution; 2) it is a flexible technique that can work with a variety of materials; 3) it is slow, being one or more orders of magnitude slower than optical lithography and 4) it is expensive and complicated – electron beam lithography tools can cost many millions of dollars and require frequent service to stay properly maintained.
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