X-ray reflectivity and non-specular scattering investigation of amorphous W/Si multilayers after rapid thermal annealing
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چکیده
منابع مشابه
Diffuse X-ray Streaks from Defects and Surface Features in Boron Implanted Silicon
In a grazing incidence X-ray diffuse scattering investigation of boron implanted silicon we have discovered narrow intensity streaks along <111> directions. From a detailed analysis of three dimensional reciprocal space maps clear evidence is found that the rodlike scattering is due to extrinsic stacking faults with an avarage diameter of 71nm, formed in the implanted layer after rapid thermal ...
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