Plasma etching of proton-exchanged lithium niobate
نویسندگان
چکیده
Plasma etching of lithium niobate with fluorine gases is limited by the redeposition LiF. This results in a low etch rate and nonvertically etched walls. Etching of proton-exchanged lithium niobate can prevent the LiF deposition to a large extent because of the greatly reduced lithium concentration in lithium niobate. We performed different inductively coupled plasma etching processes using SF6 or CHF3/Ar on proton-exchanged lithium niobate. Negligible underetching and nearly vertically etched walls on proton-exchanged lithium niobate samples were obtained by CHF3/Ar gas at chamber pressure of 6 mTorr and 130 V dc bias. © 2006 American Vacuum Society. DOI: 10.1116/1.2207150
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