Transmission near-field scanning microscope for infrared chemical imaging
نویسندگان
چکیده
We report transmission infrared near-field scanning microscopy ~IR-NSOM! imaging of chemically amplified photoresist polymers patterned by ultraviolet exposure. Chemical specificity was attained using infrared wavelengths tuned to the 3 mm OH stretch absorption band of the polymer, a band sensitive to the chemical changes characteristic of the lithographic photochemical process of this material. Contrast mechanisms are discussed together with the IR-NSOM specifics, such as the fabrication of an infrared near-field probe with high throughput, which lead to an attainable resolution of l/10 and a transmission sensitivity of 1%. © 1999 American Institute of Physics. @S0021-8979~99!05917-4#
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