Barrier-free absorbance modulation for super-resolution optical lithography.

Absorbance-modulation optical lithography.

We describe a new mode of optical lithography called absorbance-modulation optical lithography (AMOL) in which a thin film of photochromic material is placed on top of a conventional photoresist and illuminated simultaneously by a focal spot of wavelength lambda1 and a ring-shaped illumination of wavelength lambda2. The lambda1 radiation converts the photochromic material from an opaque to a tr...

Reverse-absorbance-modulation-optical lithography for optical nanopatterning at low light levels

Three-dimensional deep sub-diffraction optical beam lithography with 9 nm feature size.

The current nanofabrication techniques including electron beam lithography provide fabrication resolution in the nanometre range. The major limitation of these techniques is their incapability of arbitrary three-dimensional nanofabrication. This has stimulated the rapid development of far-field three-dimensional optical beam lithography where a laser beam is focused for maskless direct writing....

Multiple Nanowire Gate Field Effect Transistors

Novel metal oxide semiconductor field effect transistor (MOSFET) architectures aimed at sub IV operation with enhanced current driving capability are reported. In our design, the planar channel region in a conventional MOSFET is replaced by an array of isolated Si wires. Directional metal coverage of the two sidewalls and the top surface of each Si wire help achieve enhanced gate control. Sub I...

3D Super-Resolution Using a Phase Mask Fabricated via Grey-Level Lithography

Three dimensional (3D) super-resolution can be achieved in microscopy instruments by means of phase masks that shape the point spread function [1]. Grey level lithography is an attractive procedure for the generation of these phase masks. The photolithographic phase masks (PPM) encode the light emitted from a specimen via a topographical index of refraction variation consisting of a series of p...