HfO2 nanocrystal memory on SiGe channel
نویسندگان
چکیده
This study proposes a novel HfO2 nanocrystal memory on epi-SiGe (Ge: 15%) channel. Because SiGe has a smaller bandgap than that of silicon, it increases electron/hole injection and the enhances program/erase speeds. This study compares the characteristics of HfO2 nanocrystal memories with different oxynitride tunnel oxide thicknesses on Si and epi-SiGe substrate. Results show that the proposed nonvolatile memory possesses superior characteristics in terms of considerably large memory window for two-bits operation, high speed program/erase for low power applications, long retention time, excellent endurance, and strong immunity to disturbance. 2012 Elsevier Ltd. All rights reserved.
منابع مشابه
طراحی ساختاری از ترانزیستور ماسفت دوگیتی با به‌کارگیری دو ماده، اکسید هافنیم (HfO2) و سیلیسیم-ژرمانیوم (SiGe) در کانالی از جنس سیلیسیم (DM-DG)
در این مقاله ساختار جدیدی از ترانزیستور دوگیتی به نام ترانزیستور DM-DG ارائه‌شده است. در این ساختار با به کار بردن عایق HfO2 در مرز ناحیه کانال و درین و همین‌طور استفاده از سیلیسیم-ژرمانیوم در ناحیه سورس منجر به بهبود ساختار در مقایسه با ساختارهای متداول دوگیتی (C-DG) شده است. ناحیه عایق HfO2 به‌طور قابل‌توجهی میدان الکتریکی را در ناحیه کانال و درین کاهش می‌دهد؛ بنابراین فرآیندهای مخرب در ساختا...
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