Refraction effects on x-ray and ultraviolet interferometric probing of laser-produced plasmas
نویسندگان
چکیده
We present a study detailing the effects of refraction on the analysis and interpretation of line-of-site optical probe characterization techniques within laser-produced plasmas. Results using x-ray laser backlit grid deflectometry and ray-tracing simulations illustrate the extent to which refraction can be a limiting factor in diagnosing high-density, short-scale-length plasmas. Analysis is applied to a recent experiment in which softx-ray interferometry was used to measure the electron density within a fast-evolving Al plasma. Comparisons are drawn between extreme ultraviolet and ultraviolet probe wavelengths. © 2003 Optical Society of America OCIS codes: 120.3180, 120.5710.
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