Probing local strain and composition in Ge nanowires by means of tip-enhanced Raman scattering.

نویسندگان

  • J S Reparaz
  • N Peica
  • R Kirste
  • A R Goñi
  • M R Wagner
  • G Callsen
  • M I Alonso
  • M Garriga
  • I C Marcus
  • A Ronda
  • I Berbezier
  • J Maultzsch
  • C Thomsen
  • A Hoffmann
چکیده

Local strain and Ge content distribution in self-assembled, in-plane Ge/Si nanowires grown by combining molecular beam epitaxy and the metal-catalyst assisted-growth method were investigated by tip-enhanced Raman scattering. We show that this technique is essential to study variations of physical properties of single wires at the nanoscale, a task which cannot be achieved with conventional micro-Raman scattering. As two major findings, we report that (i) the Ge distribution in the (001) crystallographic direction is inhomogeneous, displaying a gradient with a higher Ge content close to the top surface, and (ii) in contrast, the (uncapped) wires exhibit essentially the same small residual compressive strain everywhere along the wire.

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عنوان ژورنال:
  • Nanotechnology

دوره 24 18  شماره 

صفحات  -

تاریخ انتشار 2013