Monte Carlo simulation of double gate silicon on insulator devices operated as velocity modulation transistors

نویسندگان

  • C. Sampedro
  • F. Gamiz
چکیده

We used an ensemble Monte Carlo simulator to study both the dc and transient behavior of a double gate silicon-on-insulator transistor sDGSOId operated as a velocity modulation transistor sVMTd and as a conventional field effect transistor sFETd. Operated as a VMT, the DGSOI transistor provides switching times shorter than 1 ps regardless of the channel length, with a significant current modulation factor at room temperature. The same device operated as a FET provides much longer switching times which, in addition, increase with the channel length. © 2005 American Institute of Physics. fDOI: 10.1063/1.1929085g

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

Electron transport in ultrathin double-gate SOI devices

Electron transport in ultrathin double-gate (DG) silicon-on-insulator (SOI) devices is studied as a function of the transverse electric field and the silicon layer thickness, with particular attention to the evaluation of stationary drift velocity and low-field mobility at room temperature. A one-electron Monte Carlo simulator has been used.  2001 Elsevier Science B.V. All rights reserved.

متن کامل

Gate bias symmetry dependency of electron mobility and prospect of velocity modulation in double-gate silicon-on-insulator transistors

We report on detailed room-temperature transport properties of a 17 nm thick double-gate silicon-on-insulator (DGSOI) transistor. We find that when the electron gas is transferred between the top and the bottom of the silicon-on-insulator (SOI) layer by changing the gate bias symmetry (i.e., applying the gate biases in a push–pull fashion), while keeping the carrier density constant the maximum...

متن کامل

A comprehensive study of velocity overshoot effects in double gate silicon on insulator transistors

A comprehensive study of velocity overshoot in double gate silicon on insulator (DGSOI) transistors has been undertaken. Monte Carlo simulations were performed to clarify the dependence of velocity overshoot effects on the low field mobility, channel inversion charge and silicon layer thickness. The relationships and dependences between the energyand momentum-relaxation times were also investig...

متن کامل

Electron mobility in double gate silicon on insulator transistors: Symmetric-gate versus asymmetric-gate configuration

We have studied electron mobility behavior in asymmetric double-gate silicon on insulator ~DGSOI! inversion layers, and compared it to the mobility in symmetric double-gate silicon on insulator devices, where volume inversion has previously been shown to play a very important role, being responsible for the enhancement of the electron mobility. Poisson’s and Schroedinger’s equations have been s...

متن کامل

Characterization of electron transport at high fields in silicon-on-insulator devices: a Monte Carlo study

The high field transport regime of single gate (SG) SOI MOSFETs has been the subject of an in-depth characterization. To study this, we have used a Monte Carlo simulator where all the major features involved in the description of the transport of state-of-the-art SOI devices are taken into account: quantization, non-parabolic band structure, phonon and surface roughness scattering. It has been ...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

عنوان ژورنال:

دوره   شماره 

صفحات  -

تاریخ انتشار 2005