Structural and Optical Properties of Zno Nanostructure Thin Film Syn- thesized By SILAR Method

Zinc Oxide (ZnO) thin film have been deposited using Successive Ionic Layer Adsorption and Reaction (SILAR) technique, which is based on alternate dipping of substrate in the solution and deionized water. The thin film was grown on glass substrate. The precursor for ZnO film was diluted aqueous solution of ZnSo4 complex with NH3. The film was investigated by X-ray diffraction, Scanning electron Microscopy and spectrophotometer. XRD measurement showed that the film was polycrystalline in the hexagonal wurtzite structure with preferred orientation (002). With the texture coefficient value of ~ 2.56, average crystallite size of 28.91 nm with Lattice constant a = b = 3.257 A0, c = 5.215 A0 and band gap 3.63 eV. The result of influence of different parameters of SILAR method on phase structure, surface morphology and optical properties are studied and discussed.