Framework for exploring the interaction between design rules and overlay control

نویسندگان

  • Rani S. Ghaida
  • Mukul Gupta
  • Puneet Gupta
چکیده

Overlay control is becoming increasingly more important with the scaling of technology. It has become even more critical and more challenging with the move toward multiple-patterning lithography, where overlay translates into CD variability. Design rules and overlay have strong interaction and can have a considerable impact on the design area, yield, and performance. We study this interaction and evaluate the overall design impact of rules, overlay characteristics, and overlay control options. For this purpose, we developed a model for yield loss from overlay that considers overlay residue after correction and the breakdown between field-to-field and within-field overlay; the model is then incorporated into a general design-rule evaluation framework to study the overlay/design interaction. The framework can be employed to optimize design rules and more accurately project overlay-control requirements of the manufacturing process. The framework is used to explore the design impact of litho-etch litho-etch double-patterning rules and poly line-end extension rule defined between poly and active layer for different overlay characteristics (i.e., within-field versus field-to-field overlay) and different overlay models at the 14-nm node. Interesting conclusions can be drawn from our results. For example, one result shows that increasing the minimum mask-overlap length by 1 nm would allow the use of a third-order wafer/ sixth-order field-level overlay model instead of a sixth-order wafer/sixth-order field-level model with negligible impact on design. 1 Introduction Overlay is the positional accuracy with which a pattern is formed on top of an existing pattern on the wafer. 1 As technology scaling continues, overlay control is becoming more important than ever to allow smaller and smaller feature sizes. Moreover, the introduction of multiple-patterning (MP) lithography, where overlay effectively translates into CD variability, 2,3 has made overlay control even more critical and more challenging. Meeting the requirements for overlay control is believed to be one of the biggest challenges for deploying MP technology.

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

A Framework for Exploring the Interaction Between Design Rules and Overlay Control

Overlay control is becoming increasingly more important with the scaling of technology. It has become even more critical and more challenging with the move toward multiple-patterning lithography, where overlay translates into CD variability. Design rules and overlay have strong interaction and can have a considerable impact on the design area, yield, and performance. This paper offers a framewo...

متن کامل

A Review on the Extent of Urban Design Intervention in Iran’s Architectural Structures for Interaction with Architectural Innovation

The intervention of urban design in Irans architectural structures has been for many years a challenging issue for architects and urban designers over their professional realm. The preservation of architectural structures in Iran has always resorted to extremes. This control and direction has sometimes resulted in exclusion of architecture position and has sometimes, once faced with lack of pro...

متن کامل

Comparing the Effectiveness of Group Story Therapy and the Art-Play Therapy on Anxiety and Depression in Children with Cancer: Based on the Framework, Principles and Rules of Cognitive-Behavioral Approach

Introduction: Anxiety and depression are among the variables that children with cancer need psychological treatment for them. The aim of this study was to determine the comparing the effectiveness of group story therapy and the art-play therapy on anxiety and depression in children with cancer based on the framework, principles and rules of cognitive-behavioral approach. Methods: The research m...

متن کامل

Exploring the Relationships between Spatial and Demographic Parameters and Urban Water Consumption in Esfahan Using Association Rule Mining

In recent years, Iran has faced serious water scarcity and excessive use of water resources. Therefore, exploring the pattern of urban water consumption and the relationships between geographic and demographic parameters and water usage is an important requirement for effective management of water resources. In this study, association rule mining has been used to analyze the data of municipal w...

متن کامل

ساخت یک نرم‎افزار رایانه‎ای جهت طراحی پروتزهای پارسیل متحرک بخش اول: نظر سنجی از اعضاء هیئت علمی در مورد قوانین طراحی پروتزهای پارسیل متحرک

Background and Aim: Proper designing of partial denture frameworks is the duty of dentists, but this task is often abdicated to technicians because of lack of time and experience. Computer assisted learning and designing can be used for both training dental students and helping dentists design proper frameworks. As the first step to prepare software for framework designing, this study evaluated...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

عنوان ژورنال:

دوره   شماره 

صفحات  -

تاریخ انتشار 2013