A plasma discharge model of a microwave plasma diamond CVD reactor

A self-consistent electromagnetic eld model and a uid plasma model have been developed for a microwave plasma reactor used for diamond chemical vapor deposition. The coupled numerical models simulate the electromagnetic excitation of the hydrogen discharge and the hydrogen plasma discharge characteristics. The time-varying electric and magnetic elds inside the reactor, both inside and outside the plasma discharge region, are obtained by applying a nite-di erence time-domain method to solve Maxwell's equations. The electromagnetic eld interactions with the plasma discharge are described using electron and ion momentum transport equations. The plasma discharge characteristics are simulated using a uid plasma model which solves the electron and ion continuity equations, electron energy balance equation, and the Poisson equation. Simulations have been performed to study the e ect of input power and pressure on hydrogen discharge characteristics such as the electron temperature and plasma density.