. bi o - ph ] 3 0 A pr 2 01 4 Coarse - grained Modeling of DNA Curvature
نویسندگان
چکیده
Gordon S. Freeman and Daniel M. Hinckley Department of Chemical and Biological Engineering University of Wisconsin–Madison, Madison, WI, 53706 USA Joshua P. Lequieu Institute for Molecular Engineering University of Chicago, Chicago, IL 60637 USA Jonathan K. Whitmer Materials Science Division Argonne National Laboratory, Argonne, IL 60439 USA Juan J. de Pablo Institute for Molecular Engineering University of Chicago, Chicago, IL 60637 USA and Materials Science Division Argonne National Laboratory, Argonne, IL 60439 USA
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