General Properties of AZ®/ TI Photoresists
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Photoresists, developers, remover, adhesion promoters, etchants, and solvents ... Phone: +49 731 36080-409 Fax: +49 731 36080-908 e-Mail: [email protected] The Resin The resin of AZ® and TI resists is Novolak, a cresol resin that is synthesized from phenol and formaldehyde. The molecular chain length adjusts important resist properties: Long chains improve the thermal stability, reduce the dark erosion but also the development rate, while short chains improve the adhesion. Thus photoresists are composed with a special mixture of resins dependent on the desired chemical and physical properties, typically 8 to 20 monomer units.
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Exposure of Photoresists
Mask-Aligner and Stepper The typical emission spectrum of a mask aligner or stepper with Hg light source and without optical selective mirrors/filters contains g(wavelength 436 nm), h(405 nm) and i-line (365 nm), with an i-line intensity approx. 40 % of the total emission between 440 and 340 nm. The absorption spectrum (spectral sensitivity see next section) of AZ® and TI photoresists is matche...
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Mask-Aligner and Stepper The typical emission spectrum of a mask aligner or stepper with Hg light source and without optical selective mirrors/filters contains g(wavelength 436 nm), h(405 nm) and i-line (365 nm) (fig. right-hand), with an iline intensity approx. 40 % of the total emission between 440 and 340 nm. The absorption spectrum (spectral sensitivity see next section) of AZ® and TI photo...
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