Novel high mobility Ga o.51 Inomd9P/GaAs modulation-doped field-effect transistor structures grown using a gas source molecular beam epitaxy

A standard Gacs11ne4sP/GaAs modulation-doped field-effect transistor (MODFET) structure and a novel Gacs11nc4sP/GaAs MODFET structure where the GacslIne4sP spacer layer was replaced by an undoped AlO,sGac,As layer were grown using a gas source molecular beam epitaxy. The Hall mobility of the novel MODFET’s structures are 6600 and 36 400 cm2/V s at room temperature and 77 K, respectively, which are more than twice as high as that in the ordinary GacS11nc,49P/GaAs MODFETs structure. The mobility is attributed to better carrier confinement and smoother heterointerface. Furthermore, it is found that both ordinary and novel MODFET’s structures have small photo-persistant conductivity effects at low temperatures and that the FETs made in these materials had no threshold voltage shift at low temperatures after illumination.