Computer Simulation from Electron Beam Lithography to Optical Lithography

Computer Simulation of Processes at Electron and Ion Beam Lithography, Part 2: Simulation of Resist Developed Images at Electron and Ion Beam Lithography

Computer Simulation of Electron and Ion Beam Lithography of Nanostructures

In this paper a review of the authors results on mathematical modeling of the processes at electron or ion beam lithography of nanostructures is presented. Our Monte Carlo simulation tools for electron and ion exposures are successfully applied for the energy deposition calculation at electron or ion lithography of resist layers. At ion lithography electronic energy losses of penetrating electr...

Fabrication and Optical Characterization of Silicon Nanostructure Arrays by Laser Interference Lithography and Metal-Assisted Chemical Etching

In this paper metal-assisted chemical etching has been applied to pattern porous silicon regions and silicon nanohole arrays in submicron period simply by using positive photoresist as a mask layer. In order to define silicon nanostructures, Metal-assisted chemical etching (MaCE) was carried out with silver catalyst. Provided solution (or materiel) in combination with laser interference lithogr...

Microlithographic Pattern Generation for Optics

For the fabrication of optical and microoptical elements like gratings, lenses, waveguides, zoneplates, computer-generated holograms and so on, a lot of different fabrication technologies are available. Some of these elements are planar elements; i.e., the optical function of such elements is realized by a thin planar layer containing special structures and/or materials. For the fabrication of ...

Three-dimensional deep sub-diffraction optical beam lithography with 9 nm feature size.

The current nanofabrication techniques including electron beam lithography provide fabrication resolution in the nanometre range. The major limitation of these techniques is their incapability of arbitrary three-dimensional nanofabrication. This has stimulated the rapid development of far-field three-dimensional optical beam lithography where a laser beam is focused for maskless direct writing....