Imaging Diagnostics of Debris from Double Pulse Laser-Produced Tin Plasma for EUV Light Source

نویسندگان

  • Tomoya Akiyama
  • Kota Okazaki
  • Daisuke Nakamura
  • Akihiko Takahashi
  • Tatsuo Okada
چکیده

The dynamics of debris from laser produced Tin (Sn) plasma was investigated for EUV light source. The kinetic behaviors of the Sn atoms and of the dense particles from Sn droplet target irradiated by double pulses from the Nd:YAG laser and the CO2 laser were also investigated by the laser-induced fluorescence imaging method and a high-speed imaging, respectively. After the pre-pulse irradiation of the Nd:YAG laser, the Sn atoms were ejected in all direction from the target with a speed of as fast as 20 km/s and the dense particle cloud expanded by a reaction force due to the plasma expansion with a speed of approximately 500 m/s. The expanding target was subsequently irradiated by the main-pulse of CO2 laser and the dense cloud was almost disappeared by main-pulse irradiation.

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

Laser produced plasma sources for nanolithography—Recent integrated simulation and benchmarking

Photon sources for extreme ultraviolet lithography (EUVL) are still facing challenging problems to achieve high volume manufacturing in the semiconductor industry. The requirements for high EUV power, longer optical system and components lifetime, and efficient mechanisms for target delivery have narrowed investigators towards the development and optimization of dual-pulse laser sources with hi...

متن کامل

Comparative study on EUV and debris emission from CO2 and Nd: YAG laser-produced tin plasmas

The emission characteristics of debris from laser-produced tin plasma were investigated for an extreme ultraviolet lithography (EUV) light source. The ions and droplets emitted from tin plasma produced by a CO2 laser or an Nd: YAG laser were detected with Faraday cups and quartz crystal micro-balance (QCM) detectors, respectively. A higher ion kinetic energy and a lower droplet emission were ob...

متن کامل

Wavelength dependence of prepulse laser beams on EUV emission from CO2 reheated Sn plasma

Extreme ultraviolet (EUV) emission from laser-produced plasmas (LPP) centered at 13.5 nm is considered a leading candidate for the light source in future lithography systems. Tin is currently the best material for generating this EUV emission since it emits strongly within the 13.5 nm region due to its various ionic states (SnSn). Highly efficient and low-debris LPPs are a pre-requisite for the...

متن کامل

Characterizing and optimizing the density profile of double-pulse laser-produced Sn-based plasmas

The plasma density profile plays a key role in the generation of 13.5 nm light for an extreme ultraviolet lithography (EUVL) source from laser-produced (LP) Sn-based plasmas due to the importance of opacity. We propose to characterize and optimize the plasma density profile to enhance conversion efficiency and mitigate debris using a double laser pulses technique. The basic idea is to separate ...

متن کامل

Analysis, simulation, and experimental studies of YAG and CO2 laser- produced plasma for EUV lithography sources

Efficient laser systems are essential for the realization of high volume manufacturing in extreme ultraviolet lithography (EUVL). Solid-state Nd:YAG lasers usually have lower efficiency and source suppliers are alternatively investigating the use of high power CO2 laser systems. However, CO2 laser-produced plasmas (LPP) have specific characteristics and features that should be taken into accoun...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

عنوان ژورنال:

دوره   شماره 

صفحات  -

تاریخ انتشار 2008