Inorganic polymer photoresist for direct ceramic patterning by photolithography.
نویسندگان
چکیده
A novel negative, inorganic polymer photoresist was demonstrated to be suitable for simple and direct fabrication of tribological SiCN-based ceramic microstructures via UV photolithography and subsequent pyrolysis at 800 degrees C.
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ورودعنوان ژورنال:
- Chemical communications
دوره 39 شماره
صفحات -
تاریخ انتشار 2007