UV-Assisted Reduction in BBL/Graphene Nanocomposite for Micropatterning
نویسندگان
چکیده
The graphene oxide (GO) film was reduced by ultraviolet (UV) irradiation which removed the oxygen-containing groups of the GO, confirmed by X-ray and Raman photoelectron spectroscopies, and scanning electron microscopy. The UV reduction of the GO film was performed at the selective areas for patterning. The sheet resistance of the GO film decreased from 10 (non-conducting) to 10 / by UV irradiation for 2 h. The GO in the BBL/GO and PVA/GO nanocomposite films could be UV-reduced to be electrically conductive. Their sheet resistances of BBL/GO (GO content = 80 wt%) and PVA/GO (GO content = 80 wt%) films were ~ 10 and 10 /, respectively after UV irradiation for ~ 2 h. The UV patterning of the PVA/GO film was demonstrated with “KNU” letters.
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