Oxide Multilayers

Multilayer thin films have been attracting attention for half-century due to many possible applications ranging from protective coating to Laser Diodes. State of the art production techniques, made it possible to deposit highquality multilayered thin films with atomically precise interfaces between different materials, including complex oxides with large and complicated unit cells [1]. Despite the better known properties of semiconductoroxide multilayer films this paper will focus on the complex oxides which promise novel properties not achievable with ordinary semiconductors [1] [2]. Strongly correlated electron materials have very less common points compared the semiconductors. Therefore, properties of the multilayer structures built with these materials cannot be examined in a common basis. In the first section of this paper the most important production techniques which are used to deposit high quality thin films will be summarized. In the second part some of the novel properties observed in different oxide-multilayers will be cited.