Numerical Investigation of Feedback Control in Plasma Processing Reactors
نویسندگان
چکیده
The continuously increasing complexity of fabricating microelectronics devices has made it necessary to consider utilizing feedback control during plasma processing steps. To investigate and optimally select control strategies, comprehensive plasma equipment models are required. This paper describes a versatile simulation tool, the Virtual Plasma Equipment Model (VPEM), that has been developed to computationally investigate feedback control in plasma processing equipment. The VPEM is an extension of a detailed plasma equipment model, which has been equipped with sensor, actuator and controller modules. The VPEM was used to investigate feedback control in inductively coupled plasmas using controllers based on a response surface methodology. The results from the VPEM suggest strategies whereby feedback control can be used to compensate for gas leaks, control drift in process parameters such as power and pressure, and nullify the effect of long term changes in wall conditions.
منابع مشابه
Controller design issues in the feedback control of radio frequency plasma processing reactors
Feedback control has the potential for improving the reliability and performance of radio frequency ~rf! plasma processing reactors for microelectronics etching, deposition, and cleaning applications. Implementation of real-time-control strategies has been slowed by lack of analytic or computational tools to design or optimize systems. To address this need, the virtual plasma equipment model ~V...
متن کاملVirtual Plasma Equipment Model: A Tool for Investigating Feedback Control in Plasma Processing Equipment
As microelectronics device feature sizes continue to shrink and wafers continue to increase in size, it is necessary to have tighter tolerances during the fabrication process to maintain high yields. Feedback control has, therefore, become an important issue in plasma processing equipment design. Comprehensive plasma equipment models linked to control algorithms would greatly aid in the investi...
متن کاملVirtual Plasma Equipment Model: A Tool For Investigating Feedback Control In Plasma Processing Equip - Semiconductor Manufacturing, IEEE Transactions on
As microelectronics device feature sizes continue to shrink and wafers continue to increase in size, it is necessary to have tighter tolerances during the fabrication process to maintain high yields. Feedback control has, therefore, become an important issue in plasma processing equipment design. Comprehensive plasma equipment models linked to control algorithms would greatly aid in the investi...
متن کاملNonlinear Burn Control in Tokamak Fusion Reactors Via Output Feedback
The next experimental step in the development of nuclear fusion reactors is the ITER tokamak. It is designed to explore the burning plasma regime in which the plasma temperature is sustained mostly by self-heating from fusion reactions. Burn control, the control of fusion power and other reactor parameters through modulation of fueling and heating, will be essential for achieving and maintainin...
متن کاملA Numerical Design Technique for a Relay - Type Feedback Control System
An efficient numerical method for the design and synthesis of compensator for a relay type control system is developed and discussed. Previous works based on the interactive graphic method are reviewed and it is shown that the combination of the trequency and time domain numerical techniques provide a powerful tool in design of a wide class of relay control systems. An example is presented to d...
متن کامل