Silicon-based photonic crystals fabricated using proton beam writing combined with electrochemical etching method
نویسندگان
چکیده
A method for fabrication of three-dimensional (3D) silicon nanostructures based on selective formation of porous silicon using ion beam irradiation of bulk p-type silicon followed by electrochemical etching is shown. It opens a route towards the fabrication of two-dimensional (2D) and 3D silicon-based photonic crystals with high flexibility and industrial compatibility. In this work, we present the fabrication of 2D photonic lattice and photonic slab structures and propose a process for the fabrication of 3D woodpile photonic crystals based on this approach. Simulated results of photonic band structures for the fabricated 2D photonic crystals show the presence of TE or TM gap in mid-infrared range.
منابع مشابه
Fabrication of porous silicon-based silicon-on-insulator photonic crystal by electrochemical etching method
We present a fast, novel method for building porous silicon-based silicon-on-insulator photonic crystals in which a periodic modulation of the refractive index is built by alternating different electrochemical etching currents. The morphology and reflectance spectra of the photonic crystals, prepared by the proposed method, are investigated. The scanning electron micrograph and atomic force mic...
متن کاملHighly flexible method for the fabrication of photonic crystal slabs based on the selective formation of porous silicon
A novel fabrication method of Si photonic slabs based on the selective formation of porous silicon is reported. Free-standing square lattices of cylindrical air holes embedded in a Si matrix can be achieved by proton beam irradiation followed by electrochemical etching of Si wafers. The photonic band structures of these slabs show several gaps for the two symmetry directions for reflection thro...
متن کاملFabrication of smooth silicon optical devices using proton beam writing
This work gives a brief review of proton beam writing and electrochemical etching process for the fabrication of smooth optical devices in bulk silicon. Various types of structures such as silicon-on-oxidized porous silicon waveguides, waveguide grating and disk resonators have been produced. Optical characterization has been carried out on the waveguides for both TE and TM polarization using f...
متن کاملFabrication of photonic band-gap crystals
We describe the fabrication of three-dimensional photonic crystals using a reproducible and reliable procedure consisting of electron beam lithography followed by a sequence of dry etching steps. Careful fabrication has enabled us to define photonic crystals with 280 nm holes defined with 350 nm center to center spacings in GaAsP and GaAs epilayers. We construct these photonic crystals by trans...
متن کاملDesign and implementation of silicon-based optical nanostructures for integrated photonic circuit applications using Deep Reactive Ion Etching (DRIE) technique
In this paper, we present the fabrication of nano optical elements by means of deep reactive ion etching technique (Bosch process) on a silicon-on-insulator substrate. The nano structures are fabricated in a two step process. The first step consists of direct-writing nanoscale patterns on PMMA polymer by electron beam lithography. These nano patterns are then transferred to the silicon surface ...
متن کامل