Variation in Particle Levitation Height with Respect to System Potential in a Complex Plasma

Dust is a common component in plasma systems, from silicon chip manufacturing to comet tails. Dust particle clouds in each of these systems can contaminate synthesis techniques or define the properties of protostellar clouds. Experiments have been conducted to describe the crystal structure within the plasma potential well, but more work needs to be done in order to describe the effect of DC bias on the shape of the potential well and the height of the layers within the potential well. By varying the DC bias in the cell, the height was found to vary experimentally as VDC 2 by experimental and numerical methods, but as VDC 1/2 for a theoretical approach. The cause of this discrepancy is yet unknown but may lie in dust charge variance or faulty assumptions. Characterization of the potential well allows for greater control of the conditions created by the applied voltage when manipulating the particles.