Large-Area Semiconducting Graphene Nanomesh Tailored by Interferometric Lithography

نویسندگان

  • Alireza Kazemi
  • Xiang He
  • Seyedhamidreza Alaie
  • Javad Ghasemi
  • Noel Mayur Dawson
  • Francesca Cavallo
  • Terefe G. Habteyes
  • Steven R. J. Brueck
  • Sanjay Krishna
چکیده

Graphene nanostructures are attracting a great deal of interest because of newly emerging properties originating from quantum confinement effects. We report on using interferometric lithography to fabricate uniform, chip-scale, semiconducting graphene nanomesh (GNM) with sub-10 nm neck widths (smallest edge-to-edge distance between two nanoholes). This approach is based on fast, low-cost, and high-yield lithographic technologies and demonstrates the feasibility of cost-effective development of large-scale semiconducting graphene sheets and devices. The GNM is estimated to have a room temperature energy bandgap of ~30 meV. Raman studies showed that the G band of the GNM experiences a blue shift and broadening compared to pristine graphene, a change which was attributed to quantum confinement and localization effects. A single-layer GNM field effect transistor exhibited promising drive current of ~3.9 μA/μm and ON/OFF current ratios of ~35 at room temperature. The ON/OFF current ratio of the GNM-device displayed distinct temperature dependence with about 24-fold enhancement at 77 K.

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عنوان ژورنال:

دوره 5  شماره 

صفحات  -

تاریخ انتشار 2015