Fabrication of Binary Diffractive Lens on Optical Films by Electron Beam Lithography
نویسندگان
چکیده
Two types of lenses can focus light: an optical lens using refraction phenomenon and a diffractive lens using diffraction phenomena. Table 1 shows the characteristics of each lens. The focal length of the diffractive lens is controlled by the structures of the lens, as mentioned in detail in Section 2.2. This suggests that the focal length of the diffractive lens is independent of refractive index and curvature. Thus, application of diffractive lenses to UV optical elements or thin optical elements is possible.
منابع مشابه
Fabrication and Performance of Diffractive Optics for Quantum Well Infrared Photodetectors
Diffractive optical elements (microlenses) for quantum well infrared photodetectors (QWIPs) were fabricated by two techniques: 1) standard lithography of a binary optical structure and 2) PMMA pattern transfer for an analog diffractive optic structure. The binary lenses were fabricated by sequential contact lithography and etching using two binary masks. The analog diffractive lenses were fabri...
متن کاملOptimal Design and Fabrication of Fine Diffractive Optical Elements Using Proximity Correction with Electron-beam Lithography
متن کامل
Microlithographic Pattern Generation for Optics
For the fabrication of optical and microoptical elements like gratings, lenses, waveguides, zoneplates, computer-generated holograms and so on, a lot of different fabrication technologies are available. Some of these elements are planar elements; i.e., the optical function of such elements is realized by a thin planar layer containing special structures and/or materials. For the fabrication of ...
متن کاملElectron beam lithography for advanced LSI fabrication
The current technology used in IC (Integrated Circuit) and LSI (Large Scale Integration) fabrication is based on optical lithography or the art of photocopying. The light wave length sets an ultimate and absolute limit on the resolution of the optical method at about one micron (JLm=10-6 meter) and the current LSI technology has almost reached this limit. In microscopy, a drastic improvement of...
متن کاملPhotolithographic fabrication method of computer-generated holographic interferograms.
We consider the fabrication of high-quality interferogram-type diffractive optical elements with conventional photolithographic techniques and compare the results with those achievable with electron-beam lithography. The fringes associated with the phase transfer function of the binary phase holographic interferogram are approximated with rectangles, which can be realized at submicron accuracy ...
متن کامل