Cryogenic Deep Reactive Ion Etching of Silicon Micro and Nanostructures
نویسنده
چکیده
OF DOCTORAL DISSERTATION HELSINKI UNIVERSITY OF TECHNOLOGY P.O. BOX 1000, FI-02015 TKK
منابع مشابه
The fabrication of silicon nanostructures by local gallium implantation and cryogenic deep reactive ion etching.
We show that gallium-ion-implanted silicon serves as an etch mask for fabrication of high aspect ratio nanostructures by cryogenic plasma etching (deep reactive ion etching). The speed of focused ion beam (FIB) patterning is greatly enhanced by the fact that only a thin approx. 30 nm surface layer needs to be modified to create a mask for the etching step. Etch selectivity between gallium-doped...
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