In-situ Film Thickness and Temperature Monitoring Using a 2 Ghz Acoustic Phase Measurement System
نویسندگان
چکیده
A 2 GHz acoustic phase measurement system has been developed and used for in-situ monitoring of thin film thickness and temperature in silicon wafer processing. Initial evaporation experiments in a vacuum station have shown a film thickness resolution of -1OOO A with a potential resolution to -1 A . The potential of this system for making temperature measurements has also been explored, and initial experiments in an oven have shown a temperature resolution of 0.01 K.
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