TiSi-nitride attenuating phase-shift photomask for 193 nm lithography
نویسندگان
چکیده
G. A. M. Reynolds, R. H. French, P. F. Carcia, C. C. Torardi, G. Hughes, D. J. Jones, M. F. Lemon, M. Reilly, L. Wilson, C. R. Miao “TiSi-nitride attenuating phase-shift photomask for 193 nm lithography”, 18th Annual BACUS Symposium on Photomask Technology and Management, SPIE Vol. 3546, Edited by B. J. Grenon, F. E. Abboud, 514-23, (1998). TiSi-nitride attenuating phase-shift photomask for 193 nm lithography Gillian A. M. Reynolds, R. H. French, P. F. Carcia, C. C. Torardi, Greg Hughes, D. J. Jones, M. F. Lemon, M. Reilly, L. Wilson, C. R. Miao
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