Selective manganese deposition for Cu_low k nano device interconnect
نویسندگان
چکیده
Son V. Nguyen, T. Vo*, D. Priyadarshini, T. Haigh Jr., T. Nogami, S. Cohen1, P. Flaitz2, Y. Lin2,3, H. Shobha, A. Grill1, D. Canaperi and Roy Gordon3, IBM at Albany Nanotech and SUNY Polytechnique University*, 257 Fuller Rd, Albany, NY 12203 USA; 1IBM T.J. Watson Research Center, 1101 Kitchawan Road, Route 134, Yorktown Heights, NY 10598 USA; 2IBM Semiconductor Research and Development Center, 2070 Route 52, Hopewell Junction, NY 12533 USA, 3 Department of Chemistry and Chemical Biology, Harvard University, Cambridge, Massachusetts, USA 02138 email: [email protected], phone: (518) 292-7237
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