Lithography –aware Design Enables “Extreme” RET
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چکیده
That formula is also the governing equation that rules optical lithography. R is the measure for resolution, or minimal feature width, which we want to resolve. In traditional semiconductor manufacturing, integrated circuit (IC) layout patterns are printed onto a silicon wafer using ‘light’ of a certain wavelength λ, projecting a mask or reticle through a lens with a certain opening angle, defined by the numerical aperture (NA).
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