Vapor deposition of copper(I) bromide films via a two-step conversion process
نویسندگان
چکیده
Kathy Liu Department of Chemistry and Chemical Biology, Harvard University, 12 Oxford Street, Cambridge, Massachusetts 02138 and Center for Excellence in Education, Research Science Institute, 8201 Greensboro Drive, Suite 215, McLean, Virginia 22102 Roy G. Gordon John A. Paulson School of Engineering and Applied Sciences, Harvard University, 29 Oxford Street, Cambridge, Massachusetts 02138 and Department of Chemistry and Chemical Biology, Harvard University, 12 Oxford Street, Cambridge, Massachusetts 02138
منابع مشابه
Direct chemical vapor deposition of graphene on dielectric surfaces.
Direct deposition of graphene on various dielectric substrates is demonstrated using a single-step chemical vapor deposition process. Single-layer graphene is formed through surface catalytic decomposition of hydrocarbon precursors on thin copper films predeposited on dielectric substrates. The copper films dewet and evaporate during or immediately after graphene growth, resulting in graphene d...
متن کاملUltrathin CVD Cu Seed Layer Formation Using Copper Oxynitride Deposition and Room Temperature Remote Hydrogen Plasma Reduction
Cu seed layers for future interconnects must have conformal step coverage, smooth surface morphology, and strong adhesion. Conformal deposition had been achieved by chemical vapor deposition CVD , but CVD Cu films have rough surfaces and poor adhesion. In this paper, conformal, smooth, adherent, continuous, and thin 9 nm Cu films were made by CVD. CuON was deposited from a Cu-amidinate precurso...
متن کاملThin, Continuous, and Conformal Copper Films by Reduction of Atomic Layer Deposited Copper Nitride
Thin and continuous copper films serve as seed layers for electrodeposition of interconnects in microelectronic devices. Gaps in the continuity of these Cu films must be avoided, because they can generate voids that later lead to failure of the devices. It is difficult to sputter completely continuous copper-seed layers into the increasingly narrow trenches and holes in modern interconnects. He...
متن کاملStable dropwise condensation for enhancing heat transfer via the initiated chemical vapor deposition (iCVD) of grafted polymer films.
Ultra-thin copolymer films are deposited by initiated chemical deposition (iCVD) to investigate their performance under the condensation of water vapor. By forming a grafted interface between the coating and the substrate, the films exhibit stable dropwise condensation even when subjected to 100 °C steam. The applicability of the iCVD to complex substrate geometries is demonstrated on a copper ...
متن کاملFabrication of Low Dislocation Density, Single-Crystalline Diamond via Two-Step Epitaxial Lateral Overgrowth
Continuous diamond films with low dislocation density were obtained by two-step epitaxial lateral overgrowth (ELO). Grooves were fabricated by inductively coupled plasma etching. Mo/Pd stripes sputtered in the grooves were used to inhibit the propagation of dislocations originating from the diamond substrate. Coalescent diamond films were achieved by ELO via microwave plasma-enhanced chemical v...
متن کامل