Optical properties of boron carbide (B5C) thin films fabricated by plasma-enhanced chemical-vapor deposition

The incorporation of Nickel and Phosphorus dopants into Boron-Carbon alloy thin films

The structural and electronic properties of nickeland phosphorus-doped boron–carbon (B5C) alloy thin films grown by plasma-enhanced chemical vapor deposition have been examined. The Ni-doped boron–carbon alloys were grown using closo-1,2-dicarbadodecaborane (C2B10H12) as the boron–carbon source compound and nickelocene (Ni(C5H5)2) as the nickel source. The phosphorus-doped alloys were grown usi...

Characterization of boron carbide thin films fabricated by plasma enhanced chemical vapor deposition from boranes

The structural homogeneity of boron carbide thin films fabricated using plasma-enhanced chemical vapor deposition from B5H9+CH4

A Review on Titanium Nitride and Titanium Carbide Single and Multilayer Coatings Deposited by Plasma Assisted Chemical Vapor Deposition

In this paper, we reviewed researches about the titanium nitride (TiN) and titanium carbide (TiC) single and multilayer coatings. These coatings were deposited by the plasma assisted chemical vapor deposition (PACVD) technique. Plasma-based technologies are used for the processing of thin films and coatings for different applications such as automobile and aerospace parts, computer disc drives,...

Synthesis and Characterization of Nanocrystalline Silicon Carbide Thin Films on Multimode Fiber Optic by means 150 MHz VHF-PECVD

In recent years, a number of advantages such as modification of nano-crystalline thin films, the ability for low-temperature deposition processes, the controlling of process, as well as high efficiency and repeatability of process, were offered using plasma deposition technique [1]. Silicon carbide (SiC) as a leading candidate for the replacement of Silicon (Si) for hightemperature and power el...