Optical constants and roughness study of dc magnetron sputtered iridium films
نویسندگان
چکیده
Optical constants and roughness study of dc magnetron sputtered iridium films" (2002). Faculty Publications from the Department of Electrical and Computer Engineering. 5. Extremely smooth thin films of iridium have been deposited onto superpolished fused silica substrates using dc magnetron sputtering in an argon plasma. The influence of deposition process parameters on film microroughness has been investigated. In addition, film optical constants have been determined using variable angle spectroscopic ellipsometry, over the spectral range from vacuum ultraviolet to middle infrared ͑140 nm–35 m͒. Because the Ir films were optically thick and the surface roughnesses were measured by atomic force microscopy then accounted for in the optical model, the as-determined film optical constants are expected to be the best available for Ir bulk metals, minimally affected by surface overlayers or microstructure.
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Study of Iridium (Ir) Thin Films Deposited on to SiO2 Substrates
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