Modelling Ge/Si quantum dots using finite element analysis and atomistic simulation

نویسندگان

  • C. Lang
  • D. Nguyen-Manh
  • D. J. H. Cockayne
چکیده

Finite Element Analysis (FEA) and atomistic simulations are used to model Ge/Si quantum dots. The three dimensional non-uniform composition profile in Ge(Si)/Si(001) quantum dots is calculated using atomistic modelling. The results are compared to experimental data from the literature. FEA is used to model the contact angle dependence of the strain energy of the QD. An equation is fitted to the modelled dataset describing the strain energy of a uniformly alloyed, pyramid shaped Ge/Si quantum dot as a function of the contact

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

Computation of Strain Distributions in Quantum Dot Nanostructures by Means of Atomistic Simulations

Strain distributions around Ge quantum dots embedded in a Si matrix are computed by means of classical molecular dynamics simulations using the molecular dynamics code IMD. The Tersoff potential is employed in order to model covalent bonds. Two crystal lattice structures are considered, the cubic and hexagonal diamond structure. The distributions of the planar strain are studied for a large num...

متن کامل

Photoemission Studies of Si Quantum Dots with Ge Core: Dots formation, Intermixing at Si-clad/Ge-core interface and Quantum Confinement Effect

Spherical Si nanocrystallites with Ge core (~20nm in average dot diameter) have been prepared by controlling selective growth conditions of lowpressure chemical vapor deposition (LPCVD) on ultrathin SiO2 using alternately pure SiH4 and 5% GeH4 diluted with He. XPS results confirm the highly selective growth of Ge on the pregrown Si dots and subsequently complete coverage by Si selective growth ...

متن کامل

Laser Level Scheme of Self-Interstitials in Epitaxial Ge Dots Encapsulated in Si

Recently, it was shown that lasing from epitaxial Ge quantum dots (QDs) on Si substrates can be obtained if they are partially amorphized by Ge ion bombardment (GIB). Here, we present a model for the microscopic origin of the radiative transitions leading to enhanced photoluminescence (PL) from such GIB-QDs. We provide an energy level scheme for GIB-QDs in a crystalline Si matrix that is based ...

متن کامل

Analysis of Strain and Intermixing in Single-Layer Ge/Si Quantum Dots Using Polarized Raman Spectroscopy

The built-in strain and composition of as-grown and Si-capped single layers of Ge/Si dots grown at various temperatures 460–800 °C are studied by a comparative analysis of the Ge-Ge and Si-Ge modes in the polarized Raman spectra of the dots. A pronounced reduction of the strain and Ge content in the dots after deposition of the cap layer at low temperatures is observed, indicating that strain-i...

متن کامل

A two dimensional Simulation of crack propagation using Adaptive Finite Element Analysis

Finite element method (FEM) is one of the most famous methods which has many applications in varies studies such as the study of crack propagation in engineering structures. However, unless extremely fine meshes are employed, problem arises in accurately modelling the singular stress field in the singular element area around the crack tip. In the present study, the crack growth simulation has b...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

عنوان ژورنال:

دوره   شماره 

صفحات  -

تاریخ انتشار 2006