residual stress in cu sputtered films on glass substrates at different substrate temperatures

Residual Stress in Cu Sputtered Films on Glass Substrates at Different Substrate Temperatures

Copper films of 300 nm thickness deposited by planar magnetron sputtering on glass substrates, for substrate temperatures between 300 and 500 K, and deposition rate of 10 ?s?1. Microstructure of these films was obtained by X-ray diffraction, while the texture mode of diffractometer was used for stress measurement by the sin2? technique. The components of the stress tensor are obtained using mea...

Residual Stress and Surface Energy of Sputtered TiN Films

Morphology, structure, residual stress, and surface energy of magnetron-sputtered titanium nitride (TiN) thin films, deposited at 300 C with a thickness in the 0.5-1.7 lm range, were characterized. Film microstructure, the origin of residual stress, and its effect on the surface energy were analyzed. The grain size increased with the film thickness. X-ray diffraction showed (200) to (111) prefe...

Evolution of anisotropic microstructure and residual stress in sputtered Cr films

A series of Cr films with varying thicknesses have been prepared using a multiple moving substrate deposition geometry. These films have been investigated with several experimental techniques, including synchrotron x-ray scattering, pole figures, electron microscope, and double crystal diffraction topography. It was found that the in-plane stresses are highly anisotropic in these Cr films. The ...

Optical properties of SiOx nanostructured films by pulsed-laser deposition at different substrate temperatures

Study of vanadium doped ZnO films prepared by dc reactive magnetron sputtering at different substrate temperatures.

ZnO films doped with vanadium (ZnO:V) have been prepared by dc reactive magnetron sputtering technique at different substrate temperatures (RT-500 degrees C). The effects of the substrate temperature on ZnO:V films properties have been studied. XRD measurements show that only ZnO polycrystalline structure has been obtained, no V2O5 or VO2 crystal phase can be observed. It has been found that th...

Structural Properties of Post Annealed ITO Thin Films at Different Temperatures

Indium tin oxide (ITO) thin films were deposited on glass substrates by RF sputtering using an ITO ceramic target (In2O3-SnO2, 90-10 wt. %). After deposition, samples were annealed at different temperatures in vacuum furnace. The post vacuum annealing effects on the structural, optical and electrical properties of ITO films were investigated. Polycrystalline...