Work Function Engineering of Thin α‐RuCl₃ by Argon Sputtering

Abstract α‐RuCl 3 is a candidate material for the realization of Kitaev spin liquid with envisioned applications quantum computing. It van‐der‐Waals in‐plane honeycomb lattice equivalent to Cr X ( = Cl, Br, I) type 2D magnets. Here, possibilities defect engineering and surface modification thin crystals are explored by Ar + dosing vacuum annealing. Chlorine easily removed from surface, which reduces Ru valence eventually leaves rich layer behind. A peculiar thickness dependence work function emerges after sputtering, ascribed remaining chlorine concentration. This elucidates properties introduces concepts property create homojunctions control level alignment standard in situ methods.