منابع مشابه
Oxidation of Wool : Effect of Hydrogen Peroxide on Wool
The purpose of this investigation was to provide quantitative data showing the effect of oxidizing agents on wool as a basis for studying all processes in which wool is exposed to oxidation reactions. The work reported in this paper deals only with the effect of hydrogen peroxide. Data are presented showing the effects on wool of varying the concentration, temperature, and pH of the hydrogen pe...
متن کاملFundamentals of Wettability
For help in preparation of this article, thanks to Austin Boyd, Gabriela Leu and Romain Prioul, Boston; Ray Kennedy, Edmonton; Patrice Ligneul, Dhahran, Saudi Arabia; John McCullagh, Sugar Land, Texas, USA; Guillemette Picard, Clamart, France; Raghu Ramamoorthy, Abu Dhabi, UAE; and Alan Sibbit, Moscow. Thanks also to the participants of the May 2007 Schlumberger Wettability Workshop, Bahrain. E...
متن کاملWool Grading
The American or Blood System The American system of grading wool was developed in the early 1800s when the native coarse-wooled sheep were being bred to finewooled Merino rams imported from Spain. It assumes that the offspring of the cross would have fleeces which were intermediate in fineness between the two parents. The wool grade is defined as the percentage of Merino blood carried by the sh...
متن کاملWettability of Nanostructured Surfaces
There are many studies in literature concerning contact angle measurements on different materials/substrates. It is documented that textiles can be coated with multifunctional materials in form of thin films or nanoparticles to acquire character‐ istics that can improve the protection and comfort of the wearer. The capacity of oxide nanostructures to inhibit fungal development and neutralize ba...
متن کاملWettability Patterning
microfabrication applications, it is widely used to transfer the designed patterns from an etching mask to the substrate. When the sample is immersed into the etching bath, the etchant only contacts and reacts with the substrate surfaces where are uncovered by the etching mask. The suitable materials for the mask can be polymers or other materials such as photoresist, SU-8,SiO2 andSi3N4, which ...
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ژورنال
عنوان ژورنال: Sen'i Gakkaishi
سال: 1977
ISSN: 0037-9875,1884-2259
DOI: 10.2115/fiber.33.9_t406