UV-Nanoimprint Lithography (NIL) Process Simulation
نویسندگان
چکیده
منابع مشابه
Soft UV Nanoimprint Lithography and Its Applications
Large-area nanopatterning technology has demonstrated high potential which can signifi‐ cantly enhance the performance of many devices and products, such as LEDs, solar cells, hard disk drives, laser diodes, display, etc [1]. For example, nano-patterned sapphire substrates (NPSS) and photonic crystals (PhC) have been considered as the most effective approaches to improve the light output effici...
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In order to keep up with the advances in nano-fabrication, alternative, cost-efficient lithography techniques need to be implemented. Two of the most promising are nanoimprint lithography (NIL) and stencil lithography. We explore here the possibility of fabricating the stamp using stencil lithography, which has the potential for a cost reduction in some fabrication facilities. We show that the ...
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Nowadays, nanodevices like small fluidic channels, semiconductor lasers, nano contacts for solar cells, nano magnets or nano antennas for infrared detection (THz) are of great interest. The applications for these devices extend the fields of e.g. energy, computational or medical sciences. For example, by arranging nano dots consisting of a magnetic material, logical circuits can be designed whi...
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The Nanoimprint lithography (NIL) is a novel method of fabricating micro/nanometer scale patterns with low cost, high throughput and high resolution (Chou et al., 1996). Unlike traditionally optical lithographic approaches, which create pattern through the use of photons or electrons to modify the chemical and physical properties of the resist, NIL relies on direct mechanical deformation of the...
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A novel liquid photo-polymerization resist was prepared for nanoimprint lithography on transparent flexible plastic substrates. The resist is a mixture of polymethylmethacrylate (PMMA), methylmethacrylate (MMA), methacylic acid (MAA) and two photo-initiators, (2-isopropyl thioxanthone (ITX) and ethyl 4-(dimethylamino)benzoate (EDAB)). The resist can be imprinted at room temperature with a press...
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ژورنال
عنوان ژورنال: Journal of Photopolymer Science and Technology
سال: 2010
ISSN: 0914-9244,1349-6336
DOI: 10.2494/photopolymer.23.25