Theoretical Exposure Dose Modeling and Phase Modulation to Pattern a VLS Plane Grating with Variable-Period Scanning Beam Interference Lithography

Variable-period scanning beam interference lithography (VP-SBIL) can be used to fabricate varied-line-spacing (VLS) plane gratings. The exposure phase modulation method pattern a VLS grating with desired groove density must carefully devised. In this paper, mathematical model of the total dose for fabrication is established. With model-based numerical calculations, effects parameters, including fringe locked phase, density, and step size, are analyzed. parameter combinations compared chosen, optimal coordinate compensation selected. calculation results show that theoretical errors coefficients controlled within 1e-8. represent deposited patterning gratings during process, chosen parameters proposed appropriate VP-SBIL.