Surface Morphology of Silicon Waveguide after Reactive Ion Etching (RIE)
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چکیده
منابع مشابه
Effect of Process Parameters on the Surface Morphology and Mechanical Performance of Silicon Structures After Deep Reactive Ion Etching (DRIE)
The ability to predict and control the influence of process parameters during silicon etching is vital for the success of most MEMS devices. In the case of deep reactive ion etching (DRIE) of silicon substrates, experimental results indicate that etch performance as well as surface morphology and post-etch mechanical behavior have a strong dependence on processing parameters. In order to unders...
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ژورنال
عنوان ژورنال: Coatings
سال: 2019
ISSN: 2079-6412
DOI: 10.3390/coatings9080478