Surface Morphology and Nanohardness of Fullerite–Aluminum Films

The surface morphology, elemental composition, and nanohardness of thin fullerite–aluminum films with different atomic fractions metal are investigated by scanning electron atomic-force microscopies, X-ray spectral microanalysis nanoindentation. obtained the method resistive evaporation in vacuum from a combined atomic-molecular flux Al atoms C60 molecules on single-crystal silicon substrates orientation (111). It is established that during deposition unheated substrates, nanocrystalline structure an fraction 20, 25 35%, average size structural elements 10, 15, nm, respectively, formed. At same time, internal mechanical stresses arise films, relaxation which leads to exfoliation significant sections film. During heated 420 K, 50–100 nm without formed, but this case decreases compared substrates.