Surface erosion and modification by highly charged ions
نویسندگان
چکیده
منابع مشابه
Surface erosion and modification by energetic ions
Surface erosion and modification by energetic highly charged and cluster ions are important in the development of semiconductor devices, TeV accelerators, fission and fusion reactors, and in the development of extreme ultra-violet lithography devices. Gas cluster ion beam (GCIB) surface treatment can significantly mitigate the high-gradient electric vacuum breakdown of rf-cavities. GCIB can als...
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In this study highly charged ions produced in Electron Beam Ion Traps are used to investigate electron capture from surfaces and gases. The experiments with gas targets focus on spectroscopic measurements of the K-shell x-rays emitted at the end of radiative cascades following electron capture into Rydberg states of Ar and Ar ions as a function of collision energy. The ions are extracted from a...
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We present first results on the generation of surface nanostuctures by slow HCI on cleaved CaF2 (111) surfaces. The CaF2 single crystals were irradiated with slow (v 1 a.u.) Xe HCI from the Heidelberg-EBIT. Like for other ionic fluoride single crystals, ion-induced surface structures in CaF2 are known to be stable in atmospheric conditions at room temperature. After irradiation the crystals wer...
متن کاملCreation of surface nanostructures by irradiation with slow, highly charged ions
It has recently been demonstrated that slow (v << 1 a.u.) highly charged ions (HCIs) are able to generate nano-sized hillocks on cleaved CaF2(1 1 1) surfaces. The aim of the present study was to explore whether surface nanostructures can also be formed on other target materials by the impact of slow HCIs. To this purpose, we have irradiated LiF(0 0 1), diamond-like carbon (DLC) and Au(1 1 1) wi...
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A new form of potential sputtering has been found for impact of slow ( < or = 1500 eV) multiply charged Xe ions (charge states up to q = 25) on MgO(x). In contrast to alkali-halide or SiO2 surfaces this mechanism requires the simultaneous presence of electronic excitation of the target material and of a kinetically formed collision cascade within the target in order to initiate the sputtering p...
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ژورنال
عنوان ژورنال: Physical Review A
سال: 2008
ISSN: 1050-2947,1094-1622
DOI: 10.1103/physreva.77.062901