Submicrometer linewidth metrology in the optical microscope
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چکیده
منابع مشابه
Submicrometer Linewidth Metrology
In 1987, the semiconductor industry was undergoing a technological transition into the submicrometer range of device dimensions. Small dimensions that are very important to device performance or yield are called critical dimensions (CD). Optical metrology technology was adequate to measure the critical dimensions above 1 m, but as these dimensions shrunk into the submicrometer regime, the indus...
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ژورنال
عنوان ژورنال: Journal of Research of the National Bureau of Standards
سال: 1987
ISSN: 0160-1741
DOI: 10.6028/jres.092.017