Study on Damage Characteristics of Fused Silica under Ion Beam Sputtering and AMP Technique

Fused silica is an optical material with excellent performance, and it widely used in the fabrication of optics various high-power laser systems. With gradual improvement systems, quality becomes crucial. Taking magnetorheological finishing (MRF), ion beam sputtering etching (IBSE), advanced mitigation processing (AMP) as means, this work focuses on exploring damage characteristics evolution fused under different techniques. In work, IBSE technique was to determinedly polish surface after removing layer by MRF technique, AMP applied etch a certain depth. Then, 10 J/cm2 (355 nm, 5 ns) irradiate surface, density maintained at low level, about 0.001/mm2, which proves that MRF, IBSE, techniques can effectively improve resistance optics.